Exponentially weighted moving average-based procedure with adaptive thresholding for monitoring nonlinear profiles: Monitoring of plasma etch process in semiconductor manufacturing

作者：

Highlights：

• Wavelet-based EWMA statistic with adaptive thresholding method proposed.

• Local shifting of functional data is of major significance.

• Features extracted from functional data in the wavelet domain.

摘要

•Wavelet-based EWMA statistic with adaptive thresholding method proposed.•Local shifting of functional data is of major significance.•Features extracted from functional data in the wavelet domain.

论文关键词：EWMA,Functional data,Plasma etching process,Local shift monitoring,Optical emission spectroscopy

论文评审过程：Available online 29 April 2013.

论文官网地址：https://doi.org/10.1016/j.eswa.2013.04.016